The 44th International Symposium on Dry Process (DPS2023)

The 44th International Symposium on Dry Process (DPS2023)

Winc Aichi, Nagoya, Japan

The 44th International Symposium on Dry Process (DPS2023) will be held at Winc Aichi, Nagoya, Japan, from November 21 to 22, 2023. The Symposium covers all aspects of the rapidly evolving fields of dry processes, including but not limited to plasma etching and deposition processes, diagnostics and modeling of plasmas and surfaces, and surface modifications by plasmas, for the applications in, e.g., microelectronics, power devices, sensors, environmental protection, biological systems, and medicine. The DPS has provided valuable forums for in-depth discussion among professionals and students working in this exciting field for more than three decades.

Dry processes and related technologies from fundamentals to applications

Etching Technologies
Manufacturing Technologies (AEC, APC, EES, FDC)
Surface Reaction and Damage
Plasma Diagnostics and Monitoring Systems
Computational Approaches (Modeling, Simulation, Machine Learning, AI, Informatics, DX) for Dry Process
Plasma Generation (Equipment/Source)
Deposition Technologies (CVD / PVD)
Atomic Layer Processes (ALD/ALE)
Dry process for Green Transformation:GX (Energy saving technology, Alternative gas, 3D-IC/Packaging)
Plasma Processes for New Material Devices (MRAM, Power, Organic, III-V, 2D)
Plasma Processes for Biological and Medical application, MEMS
Atmospheric Pressure Plasma and Liquid Plasma
New Dry Process Concepts

Arranged session
Challenges to overcome the limits for high aspect ratio etching
Atomic layer processes (ALE/ALD/ASD) toward 2nm and beyond
How AI and Machine Learning are transforming dry process technologies

お問合せ先:Symposium Secretariat: Daisuke Ogawa, Ph. D Chair, Executive Committee, DPS2023 Department of Electrical and Electronic Engineering, Chubu University