Introduction

The 40th International Conference of Photopolymer Science and Technology, Materials & Processes for Advanced Lithography, Nanotechnology and Phototechnology (ICPST-40) organized by SPST will be held at International Conference Hall, Makuhari Messe, Chiba, Japan and on On-line Meeting June 27-30, 2023. The details will appear at the SPST Homepage.

All the contributors of papers on the scientific progress and the technical development of photopolymers are cordially invited.

Scopes

The conference covers a wide range of topics relevant to photopolymer science and technology in the following fields:

A. English Symposia

A0. Plenary Talk

A1. Next Generation Lithography, EB Lithography and Nanotechnology

A2. Nanobiotechnology

A3. Directed Self Assembly (DSA)

A4. Computational / Analytical Approach for Lithography Processes

A5. EUV Lithography

A6. Nanoimprint

A7. 193 nm Lithography Extension and EUV HVM Readiness

A8. Photopolymers in 3-D Printing/ Additive Manufacturing

A9. 2D and Stimuli Responsive Materials for Electronics & Photonics

A10. Strategies and Materials for Advanced Packaging, Next Generation MEMS, Flexible Devices

A11. Chemistry for Advanced Photopolymer Science

A12. Organic and Hybrid Materials for Photovoltaic and Optoelectronic Devices

A13. Fundamentals and Applications of Biomimetics Materials and Processes

A14. General Scopes of Photopolymer Science and Technology

P. Panel Symposium

B. Japanese Symposia

B1. Polyimides and High Thermally Stable Resins -Functionalization and Practical Applications-

B2. Plasma Photochemistry and Functionalization of Polymer Surfaces

B3. General Scopes of Photopolymer Science and Technology

Language and Oral Presentation Time

English is used for presentations in English Symposia and Panel Symposium. Japanese and English are used for presentations in Japanese Symposia. Each presentation will not be longer than 20 minutes including discussion except for the notified lectures.